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Gate Dielectric Engineering with an Ultrathin Silicon-oxide Interfacial Dipole Layer for Low-Leakage Oxide-Semiconductor Memories
We demonstrate a gate dielectric engineering approach leveraging an ultrathin, atomic layer deposited (ALD) silicon oxide interfacial …
Demonstration of Transfer Learning Using 14 nm Technology Analog ReRAM Array
Analog memory presents a promising solution in the face of the growing demand for energy-efficient artificial intelligence (AI) at the …